Recent progress in subwavelength grating metamaterial engineered silicon photonic devices.

dc.centroE.T.S.I. Telecomunicaciónes_ES
dc.contributor.authorWanguemert-Pérez, Juan Gonzalo
dc.contributor.authorPérez-Armenta, Carlos
dc.contributor.authorGinel-Moreno, Pablo
dc.contributor.authorLuque-González, José Manuel
dc.contributor.authorHadij-El-Houati, Abdelfettah
dc.contributor.authorSánchez-Postigo, Alejandro
dc.contributor.authorDe-Oliva-Rubio, José
dc.contributor.authorOrtega-Moñux, Alejandro
dc.contributor.authorHalir, Robert
dc.contributor.authorSchmid, Jens H.
dc.contributor.authorCheben, Pavel
dc.contributor.authorMolina-Fernández, Íñigo
dc.date.accessioned2023-05-02T07:00:50Z
dc.date.available2023-05-02T07:00:50Z
dc.date.created2023
dc.date.issued2023
dc.departamentoIngeniería de Comunicaciones
dc.description.abstractIn this talk we present our recent advances in SWG metamaterial engineering. We will show a 1D-optical phased array composed of 112 evanescent-coupled surface emitting antennas with a length of 1.5 mm and fed by a compact distributed Bragg deflector. The measurements demonstrate a wavelength-steerable collimated beam with a far-field angular divergence of 1.8o × 0.2o. Experimental results of a bricked SWG 2×2 MMI coupler are also shown, achieving polarization agnostic performance in the 1500nm to 1560nm wavelength range. Both devices were fabricated on a standard 220-nm SOI platform using a single full-etch step process, with a minimum feature size of 80 nm, and thus compatible with immersion deep-UV lithography.es_ES
dc.description.sponsorshipThis work was supported by the High Throughput and Secure Networks Challenge Program at the National Research Council of Canada (HTSN-209, 175363-HTSN 210); Ministerio de Ciencia, Innovación y Universidades (PID2019-106747RB-I00); Ministerio de Universidades (FPU19/02408, FPU20/03487); Junta de Andalucía (P18-RT-1453); FEDER Andalucía (UMA20-FEDERJA-158); Universidad de Málaga. Campus de Excelencia Internacional Andalucía Tech.es_ES
dc.identifier.urihttps://hdl.handle.net/10630/26436
dc.language.isoenges_ES
dc.relation.eventdateAbril 2023es_ES
dc.relation.eventplacePraga (República Checa)es_ES
dc.relation.eventtitleSPIE Optics and Optoelectronics Conference 2023es_ES
dc.rights.accessRightsopen accesses_ES
dc.subjectMetamaterialeses_ES
dc.subjectAntenases_ES
dc.subjectÓptica integradaes_ES
dc.subject.otherSilicon photonicses_ES
dc.subject.otherMetamaterialses_ES
dc.subject.otherIntegrated opticses_ES
dc.subject.otherPolarization insensitivees_ES
dc.subject.otherUltra narrow beam widthes_ES
dc.subject.otherOptical antennaes_ES
dc.subject.otherSubwavelength gratinges_ES
dc.titleRecent progress in subwavelength grating metamaterial engineered silicon photonic devices.es_ES
dc.typeconference outputes_ES
dspace.entity.typePublication
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