RT Journal Article
T1 Integrated polarization beam splitter with relaxed fabrication tolerances
A1 Pérez-Galacho, Diego
A1 Halir, Robert
A1 Ortega-Moñux, Alejandro
A1 Alonso-Ramos, Carlos A.
A1 Zhang, R.
A1 Runge, Patrick
A1 Janiak, Klemens
A1 Bach, Heinz-Gunter
A1 Steffan, Andreas G.
A1 Molina-Fernández, Íñigo
K1 Comunicaciones ópticas
AB Polarization handling is a key requirement for the next generation of photonic integrated circuits (PICs). Integrated polarization beam splitters (PBS) are central elements for polarization management, but their use in PICs is hindered by poor fabrication tolerances. In this work we present a fully passive, highly fabrication tolerant polarization beam splitter, based on an asymmetrical Mach-Zehnder interferometer (MZI) with a Si/SiO2 Periodic Layer Structure (PLS) on top of one of its arms.By engineering the birefringence of the PLS we are able to design the MZI arms so that sensitivities to the most critical fabrication errors are greatly reduced. Our PBS design tolerates waveguide width variations of 400nm maintaining a polarization extinction ratio better than 13dB in the complete C-Band.
PB Optical Publishing Group
YR 2013
FD 2013-06-06
LK https://hdl.handle.net/10630/33839
UL https://hdl.handle.net/10630/33839
LA eng
NO D. Pérez-Galacho, R. Halir, A. Ortega-Moñux, C. Alonso-Ramos, R. Zhang, P. Runge, K. Janiak, H.-G. Bach, A. G. Steffan, and Í. Molina-Fernández, "Integrated polarization beam splitter with relaxed fabrication tolerances," Opt. Express 21, 14146-14151 (2013)
NO The authors want to acknowledge the funding from the Spanish Ministry of Science (project TEC2009-10152) and the European Mirthe project (FP7-2010-257980).
DS RIUMA. Repositorio Institucional de la Universidad de Málaga
RD 6 may 2026