RT Journal Article
T1 Large Beam Size Grating Coupler in Silicon-on-Insulator Using Fully Etched Subwavelength Gratings
A1 Barona-Ruiz, Miguel
A1 Moreno-Pozas, Laureano
A1 Ginel-Moreno, Pablo
A1 Ortega-Moñux, Alejandro
A1 De-Oliva-Rubio, José
A1 Molina-Fernández, Íñigo
A1 Wanguemert-Pérez, Juan Gonzalo
A1 Halir, Robert
K1 Fotónica
K1 Silicio sobre aislante
AB Several emerging applications of silicon photonics, including sensing,ranging, and optical trapping, require fixed, well-collimated beams that enableinteraction with targets placed centimeters away from the chip. Generatingsuch beams without using bulk-optic lenses entails radiating lightwaves withdiameters of hundreds of microns directly from the chip. Gratings withsufficiently low strength have so far only been shown in the silicon nitrideplatform using specialized shallow etch steps; in silicon-on-insulator theimplementation becomes much more challenging due to the increased indexcontrast. Here, the first silicon-on-insulator grating capable of radiating suchlarge beams is reported. Using a fully etched, double-period subwavelengthstructure, with feature sizes compatible with deep-ultraviolet lithography, abeam diameter in excess of 350 𝛍���������m, with a 54% radiation efficiency, isexperimentally demonstrated.
PB Wiley
SN 1863-8880
YR 2025
FD 2025-04-01
LK https://hdl.handle.net/10630/39083
UL https://hdl.handle.net/10630/39083
LA eng
NO Barona‐Ruiz, M., Moreno‐Pozas, L., Ginel‐Moreno, P., Ortega‐Moñux, A., de Oliva‐Rubio, J., Molina‐Fernández, Í., Wangüemert‐Pérez, J. G., & Halir, R. (2025). Large Beam Size Grating Coupler in Silicon‐on‐Insulator Using Fully Etched Subwavelength Gratings. Laser & Photonics Reviews.
NO Funding for open access charge: Universidad de Málaga / CBUA
DS RIUMA. Repositorio Institucional de la Universidad de Málaga
RD 21 ene 2026