<?xml version="1.0" encoding="UTF-8"?><?xml-stylesheet type="text/xsl" href="static/style.xsl"?><OAI-PMH xmlns="http://www.openarchives.org/OAI/2.0/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/ http://www.openarchives.org/OAI/2.0/OAI-PMH.xsd"><responseDate>2026-05-27T05:29:11Z</responseDate><request verb="GetRecord" identifier="oai:riuma.uma.es:10630/20512" metadataPrefix="rdf">https://riuma.uma.es/rest/oai/request</request><GetRecord><record><header><identifier>oai:riuma.uma.es:10630/20512</identifier><datestamp>2026-02-03T12:26:45Z</datestamp><setSpec>com_10630_2254</setSpec><setSpec>col_10630_37959</setSpec></header><metadata><rdf:RDF xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:doc="http://www.lyncode.com/xoai" xmlns:ds="http://dspace.org/ds/elements/1.1/" xmlns:ow="http://www.ontoweb.org/ontology/1#" xmlns:rdf="http://www.openarchives.org/OAI/2.0/rdf/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/rdf/ http://www.openarchives.org/OAI/2.0/rdf.xsd">
   <ow:Publication rdf:about="oai:riuma.uma.es:10630/20512">
      <dc:title>Metamaterial engineered C+L band 90º hybrid with 150 nm feature size</dc:title>
      <dc:creator>Hadij-El-Houati, Abdelfettah</dc:creator>
      <dc:creator>Halir, Robert</dc:creator>
      <dc:creator>Ortega-Moñux, Alejandro</dc:creator>
      <dc:creator>Wanguemert-Pérez, Juan Gonzalo</dc:creator>
      <dc:creator>Podmore, Hugh</dc:creator>
      <dc:creator>Schmid, Jens H.</dc:creator>
      <dc:creator>Cheben, Pavel</dc:creator>
      <dc:creator>Molina-Fernández, Íñigo</dc:creator>
      <dc:subject>Metamateriales</dc:subject>
      <dc:subject>Silicio sobre aislante</dc:subject>
      <dc:description>90º hybrids are important components for coherent optical communications. Conventional&#xd;
implementations only cover the C band, while broadband, metamaterial-based devices require sub-100nm feature sizes.&#xd;
We propose a design based on dual-etch silicon subwavelength structures that achieves a 170 nm bandwidth with deep-UV&#xd;
compatible feature sizes.</dc:description>
      <dc:date>2020-11-30T17:37:24Z</dc:date>
      <dc:date>2020-11-30T17:37:24Z</dc:date>
      <dc:date>2020</dc:date>
      <dc:date>2020-09-28</dc:date>
      <dc:type>conference output</dc:type>
      <dc:identifier>https://hdl.handle.net/10630/20512</dc:identifier>
      <dc:language>eng</dc:language>
      <dc:relation>IEEE Photonics Conference 2020</dc:relation>
      <dc:relation>Online</dc:relation>
      <dc:relation>28/09/2020</dc:relation>
      <dc:rights>open access</dc:rights>
   </ow:Publication>
</rdf:RDF>
</metadata></record></GetRecord></OAI-PMH>