2026-05-29T21:00:03Zhttps://riuma.uma.es/rest/oai/request

oai:riuma.uma.es:10630/264142026-02-03T10:59:39Zcom_10630_2254col_10630_37953

Polarization insensitive metamaterial engineered multimode interference coupler in a 220 nm silicon-on-insulator platform Pérez-Armenta, Carlos Ortega-Moñux, Alejandro Luque-González, José Manuel Halir, Robert Schmid, Jens Cheben, Pavel Molina-Fernández, Íñigo Wanguemert-Pérez, Juan Gonzalo Telecomunicaciones-Equipos y material Sistemas de telecomunicaciones High-index contrast silicon waveguides exhibit strong birefringence that hinders the development of polarization-insensitive devices, especially for sub-micrometer silicon layer thickness. Here a polarizationindependent 2 × 2 multimode interference coupler in a 220 nm silicon-on-insulator platform is designed and experimentally demonstrated for the first time. Leveraging the advanced control of electromagnetic properties provided by a subwavelength grating metamaterial topology, our multimode interference coupler operates for both TE and TM polarization states with measured polarization dependent loss, insertion loss and imbalance all less than 1 dB, and phase errors below 5◦ in the wavelength range from 1500 nm to 1560 nm. The device has a footprint of only 3.5 μm × 47.25 μm and was fabricated using a single etch-step process with a minimum feature size of 100 nm compatible with immersion deep-UV lithography. 2023-04-26T09:49:34Z 2023-04-26T09:49:34Z 2023 journal article Carlos Pérez-Armenta, Alejandro Ortega-Moñux, José Manuel Luque-González, Robert Halir, Jens Schmid, Pavel Cheben, Iñigo Molina-Fernández, J. Gonzalo Wangüemert-Pérez, Polarization insensitive metamaterial engineered multimode interference coupler in a 220 nm silicon-on-insulator platform, Optics & Laser Technology, Volume 164, 2023, 109493, ISSN 0030-3992, https://doi.org/10.1016/j.optlastec.2023.109493. (https://www.sciencedirect.com/science/article/pii/S0030399223003869) https://hdl.handle.net/10630/26414 https://doi.org/10.1016/j.optlastec.2023.109493 eng http://creativecommons.org/licenses/by-nc-nd/4.0/ open access Attribution-NonCommercial-NoDerivatives 4.0 Internacional Elsevier