2026-06-02T02:05:00Zhttps://riuma.uma.es/rest/oai/requestoai:riuma.uma.es:10630/340602026-03-18T07:50:16Zcom_10630_2254col_10630_37953
RIUMA. Repositorio Institucional de la Universidad de Málaga
author
Rodriguez-Moreno, Jorge
author
Navarrete-Astorga, Elena
author
Romero, Rocío
author
Martín-Jiménez, Francisco de Paula
author
Schrebler, Ricardo
author
Ramos-Barrado, José R.
2024-09-30T12:18:23Z
2024-09-30T12:18:23Z
2013
Jorge Rodríguez-Moreno, Elena Navarrete-Astorga, Rocio Romero, Francisco Martín, Ricardo Schrebler, José R. Ramos-Barrado, Enrique A. Dalchiele, Electrochemically grown vertically aligned ZnO nanorod array/p+-Si (100) heterojunction contact diodes, Thin Solid Films, Volume 548, 2013, Pages 235-240, ISSN 0040-6090, https://doi.org/10.1016/j.tsf.2013.09.091
https://hdl.handle.net/10630/34060
10.1016/j.tsf.2013.09.091
ZnO nanorod array/p+-Si vertical heterojunction diodes, in which the ZnO nanorods have been grown by electrodeposition onto a SnO2:F thin film/glass substrate, have been fabricated by the direct-bonding technique. The heterojunction diode device showed a very good rectifying behavior with a rectification ratio of the forward-to-reverse bias current as ca. 2.5 × 104 at a voltage of ± 10 V. The current–voltage (I–V) characteristic was examined in the framework of the thermionic emission model. The obtained ideality factor and the barrier height values of the diode are 2.8 and 0.85 eV, respectively. The conduction mechanisms have been investigated from I–V characteristics as well.
spa
Attribution-NonCommercial-NoDerivatives 4.0 Internacional
Diados
Electrochemically grown vertically aligned ZnO nanorod array/p+-Si (100) heterojunction contact diodes
journal article
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URL
https://riuma.uma.es/bitstreams/016f1f52-d71e-4c85-9ff4-a221888e1286/download
File
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a7854048eebc740fd24adbef290d5369
758926
application/pdf
paperdiodoZnONWspsilicio16Sept2013RefThinSolid.pdf