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      <dc:title>Band Gap Narrowing versus Formation of Electronic States in the Gap in N-TiO2 Thin Films.</dc:title>
      <dc:creator>Romero-Gómez, Pablo</dc:creator>
      <dc:creator>Hamad, Said</dc:creator>
      <dc:creator>González, Juan Carlos</dc:creator>
      <dc:creator>Barranco, Ángel</dc:creator>
      <dc:creator>Espinós, Juan Pedro</dc:creator>
      <dc:creator>Cotrino, José</dc:creator>
      <dc:creator>González Elipe, Agustin</dc:creator>
      <dc:subject>Películas degadas</dc:subject>
      <dc:subject>Electrónica del estado sólido</dc:subject>
      <dc:description>https://openpolicyfinder.jisc.ac.uk/id/publication/7799</dc:description>
      <dc:description>N-containing TiO2 thin films with different amounts of nitrogen have been prepared by plasma enhanced&#xd;
chemical vapor deposition (PECVD) by using different titanium precursors without (titanium isopropoxide,&#xd;
TTIP) and with (tetrakis diethylamino titanium, TDEAT and tetrakis dimethylamino titanium, TDMAT) nitrogen&#xd;
in their structures and different N2/O2 ratios as plasma gas. For low/high content of nitrogen, Ti-NO- and/or&#xd;
Ti-N-like species have been detected in the films by X-ray photoelectron spectroscopy (XPS). Their optical&#xd;
behavior is characterized by a red shift of their absorption edge when Ti-N species are a majority, and by&#xd;
an unmodified edge with localized absorption states in the gap when only Ti-NO-like species are present in&#xd;
the film. The experimental results have been interpreted by calculating the density of states of model systems&#xd;
consisting of a 2 × 2 × 3 repetition of the anatase unit cell. This basic structure incorporates nitrogen defects&#xd;
in either substitutional or interstitial lattice positions that are considered equivalent to the Ti-N- and Ti-NO-&#xd;
like species detected by XPS. To simulate the effect of, respectively, a low or a high concentration of nitrogen,&#xd;
calculations have been carried out by placing two nitrogen defects either in separated or in nearby positions&#xd;
of the anatase structure. The computational analysis reveals that the defects have different stabilization energies&#xd;
and confirm that an edge shift of the valence band is induced by the substitutional nitrogen centers, as observed&#xd;
when a high concentration of Ti-N species becomes incorporated into the films. In agreement with the&#xd;
experimental results, when only Ti-NO like species are detected by XPS, no band gap narrowing is obtained&#xd;
by the calculations that predict the appearance of localized electronic states in the gap.</dc:description>
      <dc:date>2025-01-22T18:22:56Z</dc:date>
      <dc:date>2025-01-22T18:22:56Z</dc:date>
      <dc:date>2010-12-02</dc:date>
      <dc:type>journal article</dc:type>
      <dc:identifier>P. Romero-Gómez, Said Hamad, J. C. González, A. Barranco, J. P. Espinós, J. Cotrino, and A. R. González-Elipe The Journal of Physical Chemistry C 2010 114 (51), 22546-22557 DOI: 10.1021/jp104634j</dc:identifier>
      <dc:identifier>https://hdl.handle.net/10630/36774</dc:identifier>
      <dc:identifier>10.1021/jp104634j</dc:identifier>
      <dc:language>eng</dc:language>
      <dc:rights>open access</dc:rights>
      <dc:publisher>ACS</dc:publisher>
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